Ion induced chemical damage to surfaces : an investigation by X-ray photoelectron spectroscopy
The current upsurge in the use of ion beam techniques in the fabrication of microelectronic devices has meant a greater understanding of the processes involved. The physical aspects of this technique have been, and continue to be, widely researched. However, until recently, little work had been unde...
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| Format: | Default Thesis |
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1985
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| Online Access: | https://hdl.handle.net/2134/13581 |
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