Atomic layer deposition (ALD) for tin whisker mitigation on Pb-free surfaces

Atomic layer deposition (ALD) for tin whisker mitigation on Pb-free surfaces

Atomic layer deposition (ALD) for tin whisker mitigation on Pb-free surfaces

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Bibliographic Details
Main Authors: Jing Wang, Mark Ashworth, Geoffrey Wilcox, Marko Pudas, Terho Kutilainen, Paul Collander, Jussi Hokka
Format: Default Conference proceeding
Published: 2016
Subjects:
Materials engineering not elsewhere classified
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Materials Engineering not elsewhere classified
Online Access:https://hdl.handle.net/2134/22028
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https://hdl.handle.net/2134/22028

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