Effect of in-plane ordering on dielectric properties of highly {111}-oriented bismuth–zinc–niobate thin films

Bi 1.5− x Zn 0.92− y Nb 1.5 O 6.92− δ (BZN) thin films were grown by pulsed laser deposition on two different Pt-covered substrates, namely textured {111}Pt/TiO 2 /SiO 2 /(100)Si substrate (Pt/Si) and epitaxial {111}Pt/R-plane sapphire substrate (Pt/sapphire). In both cases, the BZN films present {1...

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Bibliographic Details
Published in:Journal of materials science 2017-10, Vol.52 (19), p.11306-11313
Main Authors: Le Febvrier, A., Députier, S., Demange, V., Bouquet, V., Galca, A. C., Iuga, A., Pintilie, L., Guilloux-Viry, M.
Format: Article
Language:eng
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Summary:Bi 1.5− x Zn 0.92− y Nb 1.5 O 6.92− δ (BZN) thin films were grown by pulsed laser deposition on two different Pt-covered substrates, namely textured {111}Pt/TiO 2 /SiO 2 /(100)Si substrate (Pt/Si) and epitaxial {111}Pt/R-plane sapphire substrate (Pt/sapphire). In both cases, the BZN films present {111} and {100} out-of-plane orientations, in relative ratios of 65:35 on Pt/Si and 80:20 on Pt/sapphire, respectively. The film grown on Pt/Si is textured, while the film deposited on Pt/sapphire presents epitaxial-like relationships with the substrate, for both out-of-plane orientations. Dielectric measurements were taken on both types of thin films, using Pt/BZN/Pt planar capacitor structures. The BZN/Pt/sapphire film presents higher dielectric constant (245 at 100 kHz) and higher tunability (12% at 600 kV/cm) than the BZN/Pt/Si film (200; 6%), while the dielectric losses values are nearly same (~0.05).
ISSN:0022-2461
1573-4803
1573-4803