Loading…
Plasmonic nanoparticle lithography: Fast resist-free laser technique for large-scale sub-50 nm hole array fabrication
Cheap large-scale fabrication of ordered nanostructures is important for multiple applications in photonics and biomedicine including optical filters, solar cells, plasmonic biosensors, and DNA sequencing. Existing methods are either expensive or have strict limitations on the feature size and fabri...
Saved in:
| Published in: | Applied physics letters 2018-05, Vol.112 (22) |
|---|---|
| Main Authors: | , , , , , |
| Format: | Article |
| Language: | English |
| Citations: | Items that this one cites Items that cite this one |
| Online Access: | Get full text |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Summary: | Cheap large-scale fabrication of ordered nanostructures is important for multiple
applications in photonics and biomedicine including optical filters, solar cells,
plasmonic biosensors, and DNA sequencing. Existing methods are either expensive or have
strict limitations on the feature size and fabrication complexity. Here, we present a
laser-based technique, plasmonic nanoparticle lithography, which is capable of rapid
fabrication of large-scale arrays of sub-50 nm holes on various substrates. It is based on
near-field enhancement and melting induced under ordered arrays of plasmonic
nanoparticles, which are brought into contact or in close proximity to a desired material
and acting as optical near-field lenses. The nanoparticles are arranged in ordered
patterns on a flexible substrate and can be attached and removed from the patterned sample
surface. At optimized laser fluence, the nanohole patterning process does not create any
observable changes to the nanoparticles and they have been applied multiple times as
reusable near-field masks. This resist-free nanolithography technique provides a simple
and cheap solution for large-scale nanofabrication. |
|---|---|
| ISSN: | 0003-6951 1077-3118 |
| DOI: | 10.1063/1.5025096 |