Extreme ultraviolet source at 6.7nm based on a low-density plasma

We demonstrate an efficient extreme ultraviolet (EUV) source for operation at λ =6.7nm by optimizing the optical thickness of gadolinium (Gd) plasmas. Using low initial density Gd targets and dual laser pulse irradiation, we observed a maximum EUV conversion efficiency (CE) of 0.54% for 0.6% bandwid...

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Bibliographic Details
Published in:Applied physics letters 2011-11, Vol.99 (19), p.191502-191502-3
Main Authors: Higashiguchi, Takeshi, Otsuka, Takamitsu, Yugami, Noboru, Jiang, Weihua, Endo, Akira, Li, Bowen, Kilbane, Deirdre, Dunne, Padraig, O'Sullivan, Gerry
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Summary:We demonstrate an efficient extreme ultraviolet (EUV) source for operation at λ =6.7nm by optimizing the optical thickness of gadolinium (Gd) plasmas. Using low initial density Gd targets and dual laser pulse irradiation, we observed a maximum EUV conversion efficiency (CE) of 0.54% for 0.6% bandwidth (BW) (1.8% for 2% BW), which is 1.6 times larger than the 0.33% (0.6% BW) CE produced from a solid density target. Enhancement of the EUV CE by use of a low-density plasma is attributed to the reduction of self-absorption effects.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.3660275