Fabrication of Sub-5 nm Nanochannels in Insulating Substrates Using Focused Ion Beam Milling

The use of focused ion beam (FIB) milling to fabricate nanochannels with critical dimensions extending below 5 nm is described. FIB milled lines have narrowing widths as they are milled deeper into a substrate. This focusing characteristic is coupled with a two-layered architecture consisting of a r...

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Bibliographic Details
Published in:Nano letters 2011-02, Vol.11 (2), p.512-517
Main Authors: Menard, Laurent D, Ramsey, J. Michael
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Crystallization - methods
Electric Conductivity
Exact sciences and technology
Heavy Ions
Macromolecular Substances - chemistry
Materials science
Materials Testing
Metals - chemistry
Metals - radiation effects
Methods of nanofabrication
Molecular Conformation
Nanoscale pattern formation
Nanostructures - chemistry
Nanostructures - radiation effects
Nanostructures - ultrastructure
Nanotechnology - methods
Particle Size
Physics
Surface Properties
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Description
Summary:The use of focused ion beam (FIB) milling to fabricate nanochannels with critical dimensions extending below 5 nm is described. FIB milled lines have narrowing widths as they are milled deeper into a substrate. This focusing characteristic is coupled with a two-layered architecture consisting of a relatively thick (>100 nm) metal film deposited onto a substrate. A channel is milled through the metal layer until it penetrates a prescribed depth into the substrate material. The metal is then removed, leaving a nanochannel with smooth surfaces and lateral dimensions as small as sub-5 nm. These open nanochannels can be sealed with a cover plate and the resulting devices are well-suited for single-molecule DNA transport studies. This methodology is used with quartz, single-crystal silicon, and polydimethylsiloxane substrates to demonstrate its general utility.
ISSN:1530-6984
1530-6992
DOI:10.1021/nl103369g