Pattern transfer and post processing of complex nanostructures formed by e-beam exposure in PMMA

We present results on various post processing techniques to create complex 3-dimensional nanostructures with enhanced capabilities. The starting point for all architectures is a self aligned nanopillar with surrounding circular rim in PMMA. This particular shape is obtained by the energy density dis...

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Bibliographic Details
Published in:Microelectronic engineering 2011-08, Vol.88 (8), p.2533-2536
Main Authors: Gautsch, S., de Rooij, N.F.
Format: Article
Language:English
Subjects:
Applied sciences
Backscattering
Batch processing
Carbonization
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Crosslinking
DRIE
e-Beam
Electronics
Exact sciences and technology
Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties
Materials science
Methods of nanofabrication
Microelectronic fabrication (materials and surfaces technology)
Microelectronics
Nanocomposites
Nanomaterials
Nanopillars
Nanoscale pattern formation
Nanostructure
Nanostructures
Negative
Pattern transfer
Physics
PMMA
Polymethyl methacrylates
Positive
Postprocessing
Realignment
Self aligned
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Surface treatments
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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Description
Summary:We present results on various post processing techniques to create complex 3-dimensional nanostructures with enhanced capabilities. The starting point for all architectures is a self aligned nanopillar with surrounding circular rim in PMMA. This particular shape is obtained by the energy density distribution of incident and backscattered electrons of e-beam exposure and reflects the dual behavior of PMMA as positive and negative resist. Employing only 1 lithographic step and several batch processing techniques, we ensure that the creation of the complex shapes can be obtained in a reproducible manner without subsequent realignment steps. We propose several applications for these structures, covering a wide variety of research areas.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2011.02.012