Ion assistance effects on electron beam deposited MgF sub(2) films

Thin films of MgF sub(2) of about 300 nm thickness were deposited by the electron beam evaporation technique, without employing an assisting ion beam and at different assisting ion beam parameters. The role of the assisting ion beam on the film optical and structural properties and on the film resis...

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Bibliographic Details
Published in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2002-01, Vol.20 (3), p.714-720
Main Authors: Alvisi, M, De Tomasi, F, Della Patria, A, Di Giulio, M, Masetti, E, Perrone, M R, Protopapa, M L, Tepore, A
Format: Article
Language:English
Subjects:
Electron beams
Evaporation
Ion beam assisted deposition
Laser damage
Light extinction
Light reflection
Refractive index
Scanning electron microscopy
Thin films
X ray diffraction analysis
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Summary:Thin films of MgF sub(2) of about 300 nm thickness were deposited by the electron beam evaporation technique, without employing an assisting ion beam and at different assisting ion beam parameters. The role of the assisting ion beam on the film optical and structural properties and on the film resistance to laser damage was studied. Measurements were performed on samples soon after the film deposition and on samples left for 3 months under uncontrolled environmental conditions. The resulting data was analyzed in detail.
ISSN:0734-2101