Low polarization dependent diffraction grating for wavelength demultimlexing

A low polarization dependent, high diffraction efficiency grating for wavelength demultiplexer is proposed, manufactured by standard crystallographic etching of Si surface. Light is incident and diffracted inside the wafer, which is covered with reflecting metal. Optimized groove form results in a f...

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Bibliographic Details
Published in:Optics express 2004-01, Vol.12 (2), p.269-275
Main Authors: Popov, E, Hoose, J, Frankel, B, Keast, C, Fritze, M, Fan, T, Yost, D, Rabe, S
Format: Article
Language:English
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Summary:A low polarization dependent, high diffraction efficiency grating for wavelength demultiplexer is proposed, manufactured by standard crystallographic etching of Si surface. Light is incident and diffracted inside the wafer, which is covered with reflecting metal. Optimized groove form results in a flat spectral response for TE and TM polarizations.
ISSN:1094-4087
1094-4087
DOI:10.1364/OPEX.12.000269