Recent Developments in Nanofabrication Using Focused Ion Beams

Focused ion beam (FIB) technology has become increasingly popular in the fabrication of nanoscale structures. In this paper, the recent developments of the FIB technology are examined with emphasis on its ability to fabricate a wide variety of nanostructures. FIB‐based nanofabrication involves four...

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Bibliographic Details
Published in:Small (Weinheim an der Bergstrasse, Germany) Germany), 2005-10, Vol.1 (10), p.924-939
Main Author: Tseng, Ampere A.
Format: Article
Language:English
Subjects:
Carbon - chemistry
Carbon Compounds, Inorganic - chemistry
Crystallization
direct writing
Electrons
focused ion beams
Gases
Ions
Kinetics
Microscopy, Atomic Force
Microscopy, Electron, Scanning
nanofabrication
Nanoparticles
nanostructures
Nanostructures - chemistry
Nanotechnology - instrumentation
Nanotechnology - methods
Nanotechnology - trends
patterning
Silicon - chemistry
Silicon Compounds - chemistry
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Summary:Focused ion beam (FIB) technology has become increasingly popular in the fabrication of nanoscale structures. In this paper, the recent developments of the FIB technology are examined with emphasis on its ability to fabricate a wide variety of nanostructures. FIB‐based nanofabrication involves four major approaches: milling, implantation, ion‐induced deposition, and ion‐assisted etching of materials; all these approaches are reviewed separately. Following an introduction of the uniqueness and strength of the technology, the ion source and systems used for FIB are presented. The principle and specific techniques underlying each of the four approaches are subsequently studied with emphasis on their abilities of writing structures with nanoscale accuracy. The differences and uniqueness among these techniques are also discussed. Finally, concluding remarks are provided where the strength and weakness of the techniques studied are summarized and the scopes for technological improvement and future research are recommended. Focus on nanofabrication: Focused ion beam (FIB) technology is becoming an increasingly popular technique for fabrication on the nanoscale. In this Review, four areas of FIB technology are examined: milling, implantation, ion‐induced deposition, and ion‐assisted etching. Together, these techniques are likely to be at the forefront in future nanotechnology design (the picture shows a scanning ion microscopy (SIM) image of microbellows constructed using FIB‐induced deposition (FIBID)).
ISSN:1613-6810
1613-6829
DOI:10.1002/smll.200500113