Hybrid Nanoimprint−Soft Lithography with Sub-15 nm Resolution

We developed a hybrid nanoimprint−soft lithography technique with sub-15 nm resolution. It is capable of patterning both flat and curved substrates. The key component of the technology is the mold, which consists of rigid features on an elastic poly(dimethylsiloxane) (PDMS) support. The mold was fab...

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Bibliographic Details
Published in:Nano letters 2009-06, Vol.9 (6), p.2306-2310
Main Authors: Li, Zhiwei, Gu, Yanni, Wang, Lei, Ge, Haixiong, Wu, Wei, Xia, Qiangfei, Yuan, Changsheng, Chen, Yanfeng, Cui, Bo, Williams, R. Stanley
Format: Article
Language:English
Subjects:
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of nanofabrication
Nanoscale pattern formation
Physics
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Summary:We developed a hybrid nanoimprint−soft lithography technique with sub-15 nm resolution. It is capable of patterning both flat and curved substrates. The key component of the technology is the mold, which consists of rigid features on an elastic poly(dimethylsiloxane) (PDMS) support. The mold was fabricated by imprinting a reverse image onto the PDMS substrate using a UV-curable low-viscosity prepolymer film. Patterns with sub-15-nm resolution were faithfully duplicated on a flat substrate without applying external pressure. Gratings at 200 nm pitch were also successfully imprinted onto the cylindrical surface of a single mode optical fiber with a 125 μm diameter.
ISSN:1530-6984
1530-6992
DOI:10.1021/nl9004892