Formation of atomic secondary ions in sputtering

Although being investigated for decades, the formation of atomic secondary ions in sputtering is still not completely understood. By briefly summarizing the available information on velocity and work function dependences of measured ionization probabilities, we show that the formation of practically...

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Bibliographic Details
Published in:Applied surface science 2008-12, Vol.255 (4), p.1194-1200
Main Author: Wucher, A.
Format: Article
Language:English
Subjects:
Ion formation
Ionization mechanism
Ionization probability
Oxygen effect
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Summary:Although being investigated for decades, the formation of atomic secondary ions in sputtering is still not completely understood. By briefly summarizing the available information on velocity and work function dependences of measured ionization probabilities, we show that the formation of practically all analytically useful ions is governed by a combination of non-adiabatic and substrate excitation related ionization mechanisms. We also demonstrate that the oxygen matrix effect can be well described by assuming a statistical distribution of oxygen atoms within the surface emission zone.
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2008.05.252