Effect of deposition temperature and radiofrequency discharge power on mecanical properties of nitrogenated amorphous carbon

The influence of the deposition temperature and RF discharge power on the mechanical properties of nitrogenated amorphous carbon is discussed. The films are soft, porous and are easily contaminated with water vapours and other atmospheric components. The increase in deposition temperature and discha...

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Bibliographic Details
Published in:Journal of Optoelectronics and Advanced Materials 2008-09, Vol.10 (9), p.2402-2404
Main Authors: Lazar, G, Nedeff, V, Lazar, I, Bibire, L, Stamate, M, Caraman, I
Format: Article
Language:English
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Summary:The influence of the deposition temperature and RF discharge power on the mechanical properties of nitrogenated amorphous carbon is discussed. The films are soft, porous and are easily contaminated with water vapours and other atmospheric components. The increase in deposition temperature and discharge power leads to a graphitization of the films. For films deposited by sputtering with low energy species the intrinsic mechanical stress is very high and determines the films delamination. When the precursors energy increases, the nitrogen atoms are dispersed in the aromatic structure in substitutional positions, with a higher doping efficiency and with a relief of the intrinsic stress.
ISSN:1454-4164