Plasma generation in silicon-based inductive grid arrays

Selective illumination of a silicon wafer can be used for the construction of non-permanent inductive grids. A numerical model is used for the calculation of plasma density distribution in silicon as a function of time. Some indicative results on the microwave properties of the device are presented.

Bibliographic Details

Published in:	Optics and lasers in engineering 2009-11, Vol.47 (11), p.1195-1198
Main Authors:	Kontogeorgos, A.A., Korfiatis, D.P., Thoma, K.A.Th, Vardaxoglou, J.C.
Format:	Article
Language:	English
Subjects:	Electron–hole plasma Exact sciences and technology Grid arrays Optical control of microwaves Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma production and heating Plasma production and heating by laser beams
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