Loading…
Point defects in group-III nitride semiconductors studied by positron annihilation
Positron annihilation is an established technique for investigating vacancy-type defects in semiconductors. When a positron is implanted into solids, it annihilates with an electron and emits two 511 keV γ quanta. From measurements of Doppler broadening spectra of the annihilation radiation and the...
Saved in:
Published in: | Journal of crystal growth 2009-05, Vol.311 (10), p.3075-3079 |
---|---|
Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Summary: | Positron annihilation is an established technique for investigating vacancy-type defects in semiconductors. When a positron is implanted into solids, it annihilates with an electron and emits two 511
keV γ quanta. From measurements of Doppler broadening spectra of the annihilation radiation and the positron lifetimes, one can detect vacancy-type defects such as monovacancies and divacancies. We used monoenergetic positron beams to study vacancies in ion-implanted and rare-earth-doped GaN. We identified the defect species and estimated their concentrations from a comparison between the Doppler broadening spectra obtained through the experiments and those calculated using first-principles calculation (projector augmented-wave method). We have thus shown that positron annihilation is a useful tool for studying relationships between vacancy-type defects and properties of group-III nitrides. |
---|---|
ISSN: | 0022-0248 1873-5002 |
DOI: | 10.1016/j.jcrysgro.2009.01.051 |