Nanoholes by soft UV nanoimprint lithography applied to study of membrane proteins

In this paper, we present an alternative technique to the well-known electron beam lithography in order to realize nanoholes in the silicon substrates for biological applications. The used technique is soft UV nanoimprint lithography (UV-NIL). We optimized the fabrication of silicon based supports o...

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Bibliographic Details
Published in:Microelectronic engineering 2009-04, Vol.86 (4), p.583-585
Main Authors: Hamouda, F., Barbillon, G., Held, S., Agnus, G., Gogol, P., Maroutian, T., Scheuring, S., Bartenlian, B.
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Lithography
Microelectronic fabrication (materials and surfaces technology)
Nanoimprint
PDMS
RIE
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
UV-NIL
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Summary:In this paper, we present an alternative technique to the well-known electron beam lithography in order to realize nanoholes in the silicon substrates for biological applications. The used technique is soft UV nanoimprint lithography (UV-NIL). We optimized the fabrication of silicon based supports obtained by soft UV-NIL and reactive ion etching to carry out very large arrays of nanoholes. The resolution limits are investigated when using poly(dimethylsiloxane) as flexible mold material. RIE conditions are initiated to limit the lateral mask resist etch.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2008.11.086