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Multi Fermi level pinning at metal/Cu(InGa)(SeS) 2 interfaces
Metal contacts to chemically etched Cu(InGa)(SeS) 2 layers have been investigated using current–voltage and capacitance–voltage techniques. Oxidising chemicals enhance the Fermi level pinning at metal/Cu(InGa)(SeS) 2 interfaces. The formation of a Schottky barrier at metal/p-Cu(InGa)(SeS) 2 interfac...
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Published in: | Solar energy materials and solar cells 2008-08, Vol.92 (8), p.923-928 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Metal contacts to chemically etched Cu(InGa)(SeS)
2 layers have been investigated using current–voltage and capacitance–voltage techniques. Oxidising chemicals enhance the Fermi level pinning at metal/Cu(InGa)(SeS)
2 interfaces. The formation of a Schottky barrier at metal/p-Cu(InGa)(SeS)
2 interface is dominated by Fermi level pinning at one of the four levels, 0.77±0.02, 0.84±0.02, 0.93±0.02 and 1.03±0.02
eV above the valence band maximum. These observed levels determined from current–voltage measurements show a good agreement with some of the previously published photoluminescence, deep level transient spectroscopy and photo acoustic spectroscopy observations. The capacitance–voltage measurements showed that this material has near ideal doping concentration of 1.0×10
16
cm
−3 for fabricating solar cell devices. |
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ISSN: | 0927-0248 1879-3398 |
DOI: | 10.1016/j.solmat.2008.02.025 |