Control of duty ratio in waveguide gratings using a near-field holographic lithography system with a variable aperture

A waveguide grating coupler has been developed for optical coupling between a planar waveguide and an optical fiber by some researchers. In a waveguide grating coupler, the shape of diffracted output beam profiles and their focusing performance are dependent on the variations of duty ratios. Therefo...

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Bibliographic Details
Published in:Microelectronic engineering 2008-05, Vol.85 (5-6), p.925-928
Main Authors: Sung, Jun-Ho, Yang, Jeong-Su, Kim, Bo-Soon, Choi, Chul-Hyun, Lee, Min-Woo, Lee, Seung-Gol, Park, Se-Geun, Lee, El-Hang, O, Beom-Hoan
Format: Article
Language:English
Subjects:
Applied sciences
Circuit properties
Electric, optical and optoelectronic circuits
Electronics
Exact sciences and technology
Integrated optics. Optical fibers and wave guides
Microelectronic fabrication (materials and surfaces technology)
Near-field holographic lithography
Non-uniform duty ratio
Optical and optoelectronic circuits
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Waveguide grating
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Summary:A waveguide grating coupler has been developed for optical coupling between a planar waveguide and an optical fiber by some researchers. In a waveguide grating coupler, the shape of diffracted output beam profiles and their focusing performance are dependent on the variations of duty ratios. Therefore, a control of duty ratio in waveguide grating is important for more efficient optical coupling. However, the patterning of a non-uniform duty ratio in waveguide grating is generally very difficult to realize. In our experiments, we propose a new simple fabrication method, which is a variable aperture system incorporating to near-field holographic (NFH) lithography system, to realize a non-uniform duty ratio in waveguide gratings.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2008.01.094