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Growth of transparent conducting nano-structured In doped ZnO thin films by pulsed DC magnetron sputtering
Transparent conducting nano-structured In doped zinc oxide (IZO) thin films are deposited on corning 7059 glass substrates by bipolar pulsed DC magnetron sputtering with variation of pulsed frequency and substrate temperature. Highly c-axis oriented IZO thin films were grown in perpendicular to the...
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Published in: | Applied surface science 2008-02, Vol.254 (8), p.2250-2254 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Transparent conducting nano-structured In doped zinc oxide (IZO) thin films are deposited on corning 7059 glass substrates by bipolar pulsed DC magnetron sputtering with variation of pulsed frequency and substrate temperature. Highly
c-axis oriented IZO thin films were grown in perpendicular to the substrate on the 30
kHz and 500
°C. The IZO films exhibited surface roughness of 3.6
nm similar to the commercial ITO and n-type semiconducting properties with electrical resistivity (carrier mobility) of about 5
×
10
−3
Ω
cm (14
cm
2/V
s). The optical characterization showed high transmittance of over 85% in the UV–vis region and exhibited the absorption edge of near 350
nm. In micro-Raman spectra, the origin of two additional modes is attributed to the host lattice defect due to the addition of In dopant. These results suggest that the IZO film can possibly be applied to make transparent conducting electrodes for flat panel displays. |
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ISSN: | 0169-4332 1873-5584 |
DOI: | 10.1016/j.apsusc.2007.09.008 |