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Pulsed laser deposited hard TiC, ZrC, HfC and TaC films on titanium: Hardness and an energy-dispersive X-ray diffraction study
Thin films of TiC, ZrC, HfC and TaC were pulsed laser ablation deposited onto sandblasted pure titanium substrate at a laser beam fluence of 3 J/cm 2. Deposition temperature was room temperature or 500 °C. The films were investigated by scanning electron microscopy, energy-dispersive X-ray diffracti...
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Published in: | Surface & coatings technology 2008-01, Vol.202 (8), p.1455-1461 |
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Main Authors: | , , , , , |
Format: | Article |
Language: | eng ; rus |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Thin films of TiC, ZrC, HfC and TaC were pulsed laser ablation deposited onto sandblasted pure titanium substrate at a laser beam fluence of 3 J/cm
2. Deposition temperature was room temperature or 500 °C. The films were investigated by scanning electron microscopy, energy-dispersive X-ray diffraction (EDXD) and hardness measurements. The smooth and compact films of 200 to 600 nm thickness were obtained, consisting of tens nanometer particles. The rocking curve EDXD analysis revealed the films are textured. Intrinsic hardness of the films decreases generally with an increase in substrate temperature and in molecular weight of carbides. |
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ISSN: | 0257-8972 1879-3347 |
DOI: | 10.1016/j.surfcoat.2007.06.060 |