Pulsed laser deposited hard TiC, ZrC, HfC and TaC films on titanium: Hardness and an energy-dispersive X-ray diffraction study

Thin films of TiC, ZrC, HfC and TaC were pulsed laser ablation deposited onto sandblasted pure titanium substrate at a laser beam fluence of 3 J/cm 2. Deposition temperature was room temperature or 500 °C. The films were investigated by scanning electron microscopy, energy-dispersive X-ray diffracti...

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Bibliographic Details
Published in:Surface & coatings technology 2008-01, Vol.202 (8), p.1455-1461
Main Authors: Ferro, D., Rau, J.V., Rossi Albertini, V., Generosi, A., Teghil, R., Barinov, S.M.
Format: Article
Language:eng ; rus
Subjects:
Carbides
Hardness
Pulse laser ablation deposition
Thin films
X-ray diffraction
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Summary:Thin films of TiC, ZrC, HfC and TaC were pulsed laser ablation deposited onto sandblasted pure titanium substrate at a laser beam fluence of 3 J/cm 2. Deposition temperature was room temperature or 500 °C. The films were investigated by scanning electron microscopy, energy-dispersive X-ray diffraction (EDXD) and hardness measurements. The smooth and compact films of 200 to 600 nm thickness were obtained, consisting of tens nanometer particles. The rocking curve EDXD analysis revealed the films are textured. Intrinsic hardness of the films decreases generally with an increase in substrate temperature and in molecular weight of carbides.
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2007.06.060