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Double-pulse irradiation by laser-induced plasma-assisted ablation (LIPAA) and mechanisms study

Double-pulse irradiation using a near-IR femtosecond laser ( λ = 775 nm) was used to study the mechanism of the laser-induced plasma-assisted ablation (LIPAA) process. The dependence of the ablation depth on the delay time between the first and the second pulse for various target-to-substrate distan...

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Bibliographic Details
Published in:Applied surface science 2005-07, Vol.248 (1), p.276-280
Main Authors: Hanada, Y., Sugioka, K., Miyamoto, I., Midorikawa, K.
Format: Article
Language:English
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Summary:Double-pulse irradiation using a near-IR femtosecond laser ( λ = 775 nm) was used to study the mechanism of the laser-induced plasma-assisted ablation (LIPAA) process. The dependence of the ablation depth on the delay time between the first and the second pulse for various target-to-substrate distances was investigated. The first pulse generates the laser-induced plasma from the metal target, but does not induce ablation of the glass substrate. The second pulse induces the high-efficiency ablation of the substrate, delayed by several nanoseconds (ns). A possible mechanism of the conventional LIPAA process using a ns pulsed laser is discussed based on the obtained results.
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2005.03.050