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Double-pulse irradiation by laser-induced plasma-assisted ablation (LIPAA) and mechanisms study
Double-pulse irradiation using a near-IR femtosecond laser ( λ = 775 nm) was used to study the mechanism of the laser-induced plasma-assisted ablation (LIPAA) process. The dependence of the ablation depth on the delay time between the first and the second pulse for various target-to-substrate distan...
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Published in: | Applied surface science 2005-07, Vol.248 (1), p.276-280 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Double-pulse irradiation using a near-IR femtosecond laser (
λ
=
775
nm) was used to study the mechanism of the laser-induced plasma-assisted ablation (LIPAA) process. The dependence of the ablation depth on the delay time between the first and the second pulse for various target-to-substrate distances was investigated. The first pulse generates the laser-induced plasma from the metal target, but does not induce ablation of the glass substrate. The second pulse induces the high-efficiency ablation of the substrate, delayed by several nanoseconds (ns). A possible mechanism of the conventional LIPAA process using a ns pulsed laser is discussed based on the obtained results. |
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ISSN: | 0169-4332 1873-5584 |
DOI: | 10.1016/j.apsusc.2005.03.050 |