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Design of a binary metal micron grating and its application in near-infrared hot-electron photodetectors
Metal plasmonic nano-gratings possess a high absorption ability and exhibit potential applications in sensing, hot-electron photodetection, metasurfaces, etc. However, the fabrication techniques of high-quality nano-gratings are challenging. In this article, a binary metal micron grating for near-in...
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Published in: | Optics letters 2023-08, Vol.48 (15), p.4033-4036 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Metal plasmonic nano-gratings possess a high absorption ability and exhibit potential applications in sensing, hot-electron photodetection, metasurfaces, etc. However, the fabrication techniques of high-quality nano-gratings are challenging. In this article, a binary metal micron grating for near-infrared hot-electron photodetectors (HEPDs) is designed in which the surface plasmons are excited by high-diffraction-order modes. The high-diffraction-order micron grating can be fabricated by conventional lithography and has a significantly higher tolerance in the grating parameters than a nano-grating. The range of absorption greater than 70% is ∼3 times that of a nano-grating. Moreover, an interesting relationship between the resonant wavelength and the grating duty cycle is found. When the high-diffraction-order micron grating is applied in metal-insulator-metal HEPDs, a high zero-biased responsivity of 0.533 mA/W is achieved. |
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ISSN: | 0146-9592 1539-4794 |
DOI: | 10.1364/OL.497058 |