Structural characterization and properties of colloidal silica coatings on copper substrates

Colloidal silica coatings were deposited on copper substrates and their structural properties and corrosion resistance to a saline solution were studied. Optacol™ colloidal silica was used as primary reactive. Coatings were obtained by immersion and withdrawal speed was 2.1 mm/s. They were dried at...

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Bibliographic Details
Published in:Materials letters 2002-10, Vol.56 (4), p.450-453
Main Authors: Garcı́a-Cerda, L.A, Mendoza-González, O, Pérez-Robles, J.F, González-Hernández, J
Format: Article
Language:English
Subjects:
Applied sciences
Colloidal silica
Copper substrate
Cross-disciplinary physics: materials science
rheology
Electrochemical impedance spectroscopy
Exact sciences and technology
Liquid phase epitaxy
deposition from liquid phases (melts, solutions, and surface layers on liquids)
Materials science
Metals. Metallurgy
Methods of deposition of films and coatings
film growth and epitaxy
Nonmetallic coatings
Physics
Production techniques
SiO 2 thin films
Sol–gel coatings
Surface treatment
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Summary:Colloidal silica coatings were deposited on copper substrates and their structural properties and corrosion resistance to a saline solution were studied. Optacol™ colloidal silica was used as primary reactive. Coatings were obtained by immersion and withdrawal speed was 2.1 mm/s. They were dried at 100 °C during 15 min and given a heat treatment at 180 °C for 30 min. X-ray diffraction (XRD) showed the existence on the coating of a semicrystalline cristoballite phase depending on the heat treatment temperature. X-ray-photoelectron spectroscopy (XPS) demonstrated that the formation of SiO 2 bonds is enhanced when the heat treatment temperature is increased. Electrochemical impedance spectroscopy (EIS) was used to measure the corrosion resistance of these films.
ISSN:0167-577X
1873-4979
DOI:10.1016/S0167-577X(02)00526-8