Molybdenum precursor delivery approaches in atomic layer deposition of α-MoO3

In this research work, we present a study on time-sequenced plasma-enhanced atomic layer deposition (PE-ALD) processes towards the achievement of high-quality α-MoO3 thin films which are suitable for exfoliation. In particular, a conventional precursor injection method along with a boosted precursor...

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Bibliographic Details
Published in:Dalton transactions : an international journal of inorganic chemistry 2023-01, Vol.52 (4), p.902-908
Main Authors: Lorenzo, Daniela, Tobaldi, David Maria, Tasco, Vittorianna, Esposito, Marco, Passaseo, Adriana, Cuscunà, Massimo
Format: Article
Language:English
Subjects:
Atomic layer epitaxy
Atomic properties
Molybdenum trioxide
Precursors
Thermal energy
Thin films
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Summary:In this research work, we present a study on time-sequenced plasma-enhanced atomic layer deposition (PE-ALD) processes towards the achievement of high-quality α-MoO3 thin films which are suitable for exfoliation. In particular, a conventional precursor injection method along with a boosted precursor delivery approach are discussed and analysed. In the latter, the proposed gas supply mechanism ensures a large number of deposited Mo atoms per unit of time, which, along with a proper thermal energy, leads to high-quality and oriented orthorhombic α-MoO3 films. The proposed boosted approach is also compared with post growth annealing steps, resulting in more effective achievement of a highly oriented orthorhombic α-MoO3 phase and less time consumption.
ISSN:1477-9226
1477-9234
DOI:10.1039/d2dt03702e