Control composition study of sputtered NiTi shape memory alloy film

Since the transition temperature of the shape memory effect in Ni x Ti 1− x films depends on the composition of the layer, it is indispensable to have an accurate control on their composition. We are now able to control in situ the composition of r.f. sputtered NiTi films in the whole domain of sha...

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Bibliographic Details
Published in:Materials science & engineering. B, Solid-state materials for advanced technology Solid-state materials for advanced technology, 1995-11, Vol.34 (2), p.112-115
Main Authors: Bendahan, Marc, Canet, Pierre, Seguin, Jean-Luc, Carchano, Hervé
Format: Article
Language:English
Subjects:
Applied sciences
Condensed matter: structure, mechanical and thermal properties
Deformation and plasticity (including yield, ductility, and superplasticity)
Exact sciences and technology
Mechanical and acoustical properties of condensed matter
Mechanical properties of solids
Metals. Metallurgy
NiTi
Physics
Shape memory alloy
Sputtering
Thin film
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Summary:Since the transition temperature of the shape memory effect in Ni x Ti 1− x films depends on the composition of the layer, it is indispensable to have an accurate control on their composition. We are now able to control in situ the composition of r.f. sputtered NiTi films in the whole domain of shape memory effect (0.476 < x < 0.531), by varying the product of sputtering gas pressure P and target-to-substrate distance d. Pressure measurements are found to give a good sensitivity for the control of Ti-rich layers, while the optical emission spectroscopy of the sputtering plasma gives better sensitivity for Ni-rich layers.
ISSN:0921-5107
1873-4944
DOI:10.1016/0921-5107(95)01237-0