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Growth of ultrathin Cu films on CaO(100)
The deposition of Cu on a CaO(100) surface at 300 K by electron beam evaporation was studied by AES, EELS, and LEED. The AES growth curves show breaks at a Cu coverage of 1.8×10 15 cm −2. At this coverage, a sharp (1×1) LEED pattern is observed. The lattice mismatch between Cu and CaO(100) is −6%, a...
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Published in: | Surface science 1999-09, Vol.439 (1), p.139-145 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The deposition of Cu on a CaO(100) surface at 300
K by electron beam evaporation was studied by AES, EELS, and LEED. The AES growth curves show breaks at a Cu coverage of 1.8×10
15
cm
−2. At this coverage, a sharp (1×1) LEED pattern is observed. The lattice mismatch between Cu and CaO(100) is −6%, and the break point coverage of 1.8×10
15
cm
−2 corresponds to the expected coverage for a compressed Cu(100) layer. These results thus suggest that initially a c(1×1) Cu layer is formed on the CaO(100) surface. Furthermore, the EEL spectra show a clear reduction in the CaO surface plasmon peak at the break point coverage, and a Cu related peak is observed around 5
eV.
For higher coverages, e.g. corresponding to five Cu layers, the growth mode is 3D. Furthermore, changes in the Auger spectra and LEED patterns observed upon annealing to 525
K show that the Cu monolayer film agglomerates into 3D particles, uncovering the CaO(100) surface. |
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ISSN: | 0039-6028 1879-2758 |
DOI: | 10.1016/S0039-6028(99)00751-7 |