Patterning of Oriented Photofunctional Polymer Systems Through Selective Photobleaching

Many applications of semiconducting conjugated polymers in (opto)electronic devices require the patterning of these functional materials into structures with feature sizes of typically between 1 and 100 μm, ideally by simple and reliable methods. We demonstrate that selective photobleaching, i.e., a...

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Bibliographic Details
Published in:Advanced functional materials 2001-02, Vol.11 (1), p.31-35
Main Authors: Kocher, C., Montali, A., Smith, P., Weder, C.
Format: Article
Language:English
Subjects:
Conjugated polymers
Micropatterning
Photobleaching
Semiconducting polymers
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Summary:Many applications of semiconducting conjugated polymers in (opto)electronic devices require the patterning of these functional materials into structures with feature sizes of typically between 1 and 100 μm, ideally by simple and reliable methods. We demonstrate that selective photobleaching, i.e., a spatially resolved change of the chemical structure of the active species by irradiation through an appropriate mask, is an extremely simple and versatile technique that satisfies this need. The process is particularly attractive for structuring oriented materials that exhibit anisotropic properties and is of potential interest for a broad range of applications. Selective photobleaching—a spatially resolved change of the chemical structure of an active species by irradiation through an appropriate mask—is shown to be an extremely simple and versatile technique for the patterning of semiconducting conjugated polymers. The Figure, a portrait of Hermann Staudinger, demonstrates that high‐information‐content structures of high resolution can be easily obtained.
ISSN:1616-301X
1616-3028
DOI:10.1002/1616-3028(200102)11:1<31::AID-ADFM31>3.0.CO;2-U