A 1:1 MIM cathode electron-projection stepper

An electron-projection lithography system imaging a mask of an integrated circuit in 1:1 ratio by using the so called M-I-M (metal- insulator-metal) cathode in uniform eledtric and coaxial magnetic fields was investigated. An experimental 1:1 stepper was constructed and the possibility of acheiving...

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Bibliographic Details
Published in:Microelectronic engineering 1990, Vol.11 (1), p.359-362
Main Authors: Delong, Armin, Kolařik, Vladmír
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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Summary:An electron-projection lithography system imaging a mask of an integrated circuit in 1:1 ratio by using the so called M-I-M (metal- insulator-metal) cathode in uniform eledtric and coaxial magnetic fields was investigated. An experimental 1:1 stepper was constructed and the possibility of acheiving parameters required by submicron lithography was examined.
ISSN:0167-9317
1873-5568
DOI:10.1016/0167-9317(90)90130-L