Loading…
Understanding and controlling the covalent functionalisation of graphene
Chemical functionalisation is one of the most active areas of graphene research, motivated by fundamental science, the opportunities to adjust or supplement intrinsic properties, and the need to assemble materials for a broad array of applications. Historically, the primary consideration has been th...
Saved in:
Published in: | Dalton transactions : an international journal of inorganic chemistry 2020-08, Vol.49 (3), p.138-1318 |
---|---|
Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Summary: | Chemical functionalisation is one of the most active areas of graphene research, motivated by fundamental science, the opportunities to adjust or supplement intrinsic properties, and the need to assemble materials for a broad array of applications. Historically, the primary consideration has been the degree of functionalisation but there is growing interest in understanding how and where modification occurs. Reactions may proceed preferentially at edges, defects, or on graphitic faces; they may be correlated, uncorrelated, or anti-correlated with previously grafted sites. A detailed collation of existing literature data indicates that steric effects play a strong role in limiting the extent of reaction. However, the pattern of functionalisation may have important effects on the resulting properties. This article addresses the unifying principles of current graphene functionalisation technologies, with emphasis on understanding and controlling the locus of functionalisation.
Chemical functionalisation is one of the most active areas of graphene research, motivated by both fundamental science and the opportunities to adjust or supplement intrinsic properties. There is increasing interest in understanding and controlling the locus of reaction. |
---|---|
ISSN: | 1477-9226 1477-9234 |
DOI: | 10.1039/d0dt01589j |