Loading…
Electrically-alterable memory using a dual electron injector structure
A novel type of electrically-alterable memory which uses the phenomenon of enhanced electron injection into SiO 2 from Si-rich SiO 2 to charge or discharge a floating polycrystalline Si storage layer in a metal-oxide-semiconductor field-effect-transistor is described. This non-volatile memory differ...
Saved in:
Published in: | IEEE electron device letters 1980-09, Vol.1 (9), p.179-181 |
---|---|
Main Authors: | , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Summary: | A novel type of electrically-alterable memory which uses the phenomenon of enhanced electron injection into SiO 2 from Si-rich SiO 2 to charge or discharge a floating polycrystalline Si storage layer in a metal-oxide-semiconductor field-effect-transistor is described. This non-volatile memory differs from others using floating polycrystalline Si in the charging or discharging process. This improvement is accomplished by using a chemically-vapor-deposited stack of Si-rich-SiO 2 -SiO 2 -Si-rich-SiO 2 between the floating polycrystalline Si layer and the control gate electrode. This device is capable of being written or erased in 5 msec at voltages of ≤ 16 V and in 2 µsec at voltages ≤ 23 V with excellent charge retention. |
---|---|
ISSN: | 0741-3106 1558-0563 |
DOI: | 10.1109/EDL.1980.25279 |