Top-down method to introduce ultra-high elastic strain

Elastic strain is an effective and thus widely used parameter to control and modify the electrical, optical, and magnetic properties of crystalline solid-state materials. It has a large impact on device performance and enables adjusting the materials functionality. Here, we promote a micromechanical...

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Bibliographic Details
Published in:Journal of materials research 2017-02, Vol.32 (4), p.726-736
Main Authors: Zabel, Thomas, Geiger, Richard, Marin, Esteban, Müller, Elisabeth, Diaz, Ana, Bonzon, Christopher, Süess, Martin J., Spolenak, Ralph, Faist, Jérôme, Sigg, Hans
Format: Article
Language:English
Subjects:
Applied and Technical Physics
Biomaterials
Constraining
Crystal structure
Design
Devices
Etching
Fracture mechanics
Inorganic Chemistry
Invited Paper
Materials Engineering
Materials research
Materials Science
Microelectromechanical systems
Nanotechnology
Parameter modification
Physical properties
Scanning electron microscopy
Semiconductors
Strain
Transistors
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Summary:Elastic strain is an effective and thus widely used parameter to control and modify the electrical, optical, and magnetic properties of crystalline solid-state materials. It has a large impact on device performance and enables adjusting the materials functionality. Here, we promote a micromechanical strain enhancement technology to achieve ultra-high strain in semiconductors. The here presented suspended membranes enable the accurate control of the strain on a wafer-scale by standard top-down fabrication methods making it attractive for both device applications and also, thanks to the simplicity of the method, for fundamental research. This review aims at discussing the process of strain enhancement and its usage as an investigation platform for strain-related physical properties. Furthermore, we present design rules and a detailed analysis of fracture effects limiting the strain enhancement.
ISSN:0884-2914
2044-5326
DOI:10.1557/jmr.2017.31