Nanocolumnar Composite Microstructure of Superhard SiC Thin Film Deposited Using Unbalanced Magnetron Sputtering Method

Nano‐composite microstructure composed of nano‐columnar SiC crystalline grains embedded in an amorphous SiC matrix is responsible for the superhardness of the SiC thin film deposited using unbalanced magnetron sputtering. Hardness larger than 40 GPa, which is much larger than polycrystalline SiC mat...

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Bibliographic Details
Published in:Advanced engineering materials 2016-07, Vol.18 (7), p.1123-1126
Main Authors: Bae, K.-E., Chae, K.-W., Park, J.-K., Lee, W.-S., Baik, Y.-J.
Format: Article
Language:English
Subjects:
Crystal structure
Grains
Hardness
Magnetron sputtering
Microstructure
Nanostructure
Silicon carbide
Thin films
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Summary:Nano‐composite microstructure composed of nano‐columnar SiC crystalline grains embedded in an amorphous SiC matrix is responsible for the superhardness of the SiC thin film deposited using unbalanced magnetron sputtering. Hardness larger than 40 GPa, which is much larger than polycrystalline SiC materials, is obtained by controlling its microstructure of the SiC thin films.
ISSN:1438-1656
1527-2648
DOI:10.1002/adem.201600008