Guided Assembly of Gold Colloidal Nanoparticles on Silicon Substrates Prepatterned by Charged Particle Beams

Colloidal gold nanoparticles represent technological building blocks which are easy to fabricate while keeping full control of their shape and dimensions. Here, we report on a simple two-step maskless process to assemble gold nanoparticles from a water colloidal solution at specific sites of a silic...

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Bibliographic Details
Published in:ACS nano 2012-11, Vol.6 (11), p.10098-10106
Main Authors: Kolíbal, Miroslav, Konečný, Martin, Ligmajer, Filip, Škoda, David, Vystavěl, Tomáš, Zlámal, Jakub, Varga, Peter, Šikola, Tomáš
Format: Article
Language:English
Subjects:
Beams (radiation)
Charged particles
Colloids
Colloids - chemistry
Colloids - radiation effects
Crystallization - methods
Gold
Gold - chemistry
Gold - radiation effects
Heavy Ions
Materials Testing
Metal Nanoparticles - chemistry
Metal Nanoparticles - radiation effects
Nanoparticles
Nanostructure
Oxides
Particle Accelerators
Particle beams
Particle Size
Silicon - chemistry
Silicon - radiation effects
Silicon substrates
Surface Properties - radiation effects
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Summary:Colloidal gold nanoparticles represent technological building blocks which are easy to fabricate while keeping full control of their shape and dimensions. Here, we report on a simple two-step maskless process to assemble gold nanoparticles from a water colloidal solution at specific sites of a silicon surface. First, the silicon substrate covered by native oxide is exposed to a charged particle beam (ions or electrons) and then immersed in a HF-modified solution of colloidal nanoparticles. The irradiation of the native oxide layer by a low-fluence charged particle beam causes changes in the type of surface-terminating groups, while the large fluences induce even more profound modification of surface composition. Hence, by a proper selection of the initial substrate termination, solution pH, and beam fluence, either positive or negative deposition of the colloidal nanoparticles can be achieved.
ISSN:1936-0851
1936-086X
DOI:10.1021/nn3038226