Influence of titanium-substrate roughness on Ca–P–O thin films grown by atomic layer deposition

Amorphous Ca–P–O films were deposited on titanium substrates using atomic layer deposition, while maintaining a uniform Ca/P pulsing ratio of 6/1 with varying number of atomic layer deposition cycles starting from 10 up to 208. Prior to film deposition the titanium substrates were mechanically abrad...

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Bibliographic Details
Published in:Thin solid films 2013-03, Vol.531, p.26-31
Main Authors: Ananda Sagari, A.R., Malm, Jari, Laitinen, Mikko, Rahkila, Paavo, Hongqiang, Ma, Putkonen, Matti, Karppinen, Maarit, Whitlow, Harry J., Sajavaara, Timo
Format: Article
Language:English
Subjects:
Atomic force microcopy
Atomic layer deposition
Atomic properties
Biocompatibility
Biomaterials
Cell adhesion
Composition and phase identification
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Deposition
Diamonds
Elemental profiling
Exact sciences and technology
Fullerenes and related materials
diamonds, graphite
Ion beam analysis
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Pastes
Physics
Polished
Roughness
Specific materials
Structure and morphology
thickness
Surface patterning
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Thin films
Titanium
Vapor phase epitaxy
growth from vapor phase
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Summary:Amorphous Ca–P–O films were deposited on titanium substrates using atomic layer deposition, while maintaining a uniform Ca/P pulsing ratio of 6/1 with varying number of atomic layer deposition cycles starting from 10 up to 208. Prior to film deposition the titanium substrates were mechanically abraded using SiC abrasive paper of 600, 1200, 2000 grit size and polished with 3μm diamond paste to obtain surface roughness Rrms values of 0.31μm, 0.26μm, 0.16μm, and 0.10μm, respectively. The composition and film thickness of as-deposited amorphous films were studied using Time-Of-Flight Elastic Recoil Detection Analysis. The results showed that uniform films could be deposited on rough metal surfaces with a clear dependence of substrate roughness on the Ca/P atomic ratio of thin films. The in vitro cell-culture studies using MC3T3 mouse osteoblast showed a greater coverage of cells on the surface polished with diamond paste in comparison to rougher surfaces after 24h culture. No statistically significant difference was observed between Ca–P–O coated and un-coated Ti surfaces for the measured roughness value. The deposited 50nm thick films did not dissolve during the cell culture experiment. ► Atomic layer deposition of Ca–P–O films on abraded Ti substrate ► Surface analysis using Time-Of-Flight Elastic Recoil Detection Analysis ► Dependence of substrate roughness on the Ca/P atomic ratio of thin films ► An increase in Ca/P atomic ratio with decreasing roughness ► Mouse osteoblast showed greater coverage of cells in polished surface.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2012.11.137