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Properties of fluorine and tin co-doped ZnO thin films deposited by sol–gel method

•F and Sn co-doped ZnO thin films were synthesized by sol–gel method.•The effects of different F doping concentrations were investigated.•The co-doped nanocrystals exhibit good crystal quality.•The origin of the photoluminescence emissions was discussed.•The films showed high transmittance and low r...

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Bibliographic Details
Published in:Journal of alloys and compounds 2013-11, Vol.576, p.31-37
Main Authors: Pan, Zhanchang, Zhang, Pengwei, Tian, Xinlong, Cheng, Guo, Xie, Yinghao, Zhang, Huangchu, Zeng, Xiangfu, Xiao, Chumin, Hu, Guanghui, Wei, Zhigang
Format: Article
Language:English
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Summary:•F and Sn co-doped ZnO thin films were synthesized by sol–gel method.•The effects of different F doping concentrations were investigated.•The co-doped nanocrystals exhibit good crystal quality.•The origin of the photoluminescence emissions was discussed.•The films showed high transmittance and low resistivity. Highly transparent and conducting fluorine (F) and tin (Sn) co-doped ZnO (FTZO) thin films were deposited on glass substrates by the sol–gel processing. The structure and morphology of the films are characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and high resolution transmission electron microscopy (HRTEM) with various F doping concentrations. SEM images showed that the hexagonal ZnO crystals were well-arranged on the glass substrates and the HRTEM images indicated that the individual nanocrystals are highly oriented and exhibited a perfect lattice structure. Owing to its high carrier concentration and mobility, as well as good crystal quality, a minimum resistivity of 1×10−3Ωcm was obtained from the FTZO thin film with 3% F doping, and the average optical transmittance in the entire visible wavelength region was higher than 90%. The X-ray photoelectron spectroscopy (XPS) study confirmed the substitution of Zn2+ by Sn ions and Room temperature photoluminescence (PL) observed for pure and FTZO thin films suggested the films exhibit a good crystallinity with a very low defect concentration.
ISSN:0925-8388
1873-4669
DOI:10.1016/j.jallcom.2013.04.132