Spontaneous nanoscale polymer solution patterning using solvent evaporation driven double-dewetting edge lithography

We develop an innovative solution processable edge lithography, which we call double-dewetting edge lithography (DDEL). The polymer solution spontaneously dewets the hydrophobic regions and covers only hydrophilic regions on a surface energy-engineered substrate, which is achieved by a combination o...

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Bibliographic Details
Published in:Soft matter 2012-01, Vol.8 (2), p.465-471
Main Authors: Lee, Kwang-Ho, Kim, Sang-Mook, Jeong, Huisu, Jung, Gun-Young
Format: Article
Language:English
Subjects:
Evaporation
Lithography
Nanocomposites
Nanomaterials
Nanostructure
Patterning
Photolithography
Solvents
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Summary:We develop an innovative solution processable edge lithography, which we call double-dewetting edge lithography (DDEL). The polymer solution spontaneously dewets the hydrophobic regions and covers only hydrophilic regions on a surface energy-engineered substrate, which is achieved by a combination of conventional photolithography and a subsequent hydrophobic treatment of the exposed areas. Then, the secondary dewetting occurs through a coffee stain effect during the solvent evaporation, leaving polymer edge patterns behind. The whole double-dewetting phenomenon is complete within 1 s. This technique is a fast, cost-effective and easy direct solution patterning method, which enables nanoscale polymer edge patterns to be produced from various micron-scale platforms including lines, angular and irregular shapes.
ISSN:1744-683X
1744-6848
DOI:10.1039/C1SM06431B