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Preparation of a dense TiO2 thin film by oxidizing metallic titanium
We prepared a dense rutile TiO2 thin film that has a refractive index as high as that of the bulk crystal by oxidizing metallic Ti thin film. The TiO2 thin film with a thickness of 260nm is optically transparent and has low coefficients of absorption and scattering. We annealed a Ti thin film at 100...
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Published in: | Thin solid films 2013-06, Vol.537, p.23-27 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | We prepared a dense rutile TiO2 thin film that has a refractive index as high as that of the bulk crystal by oxidizing metallic Ti thin film. The TiO2 thin film with a thickness of 260nm is optically transparent and has low coefficients of absorption and scattering. We annealed a Ti thin film at 1000°C for oxidation and crystallization after deposition of metallic Ti by electron-beam evaporation. By optimizing the annealing conditions, we obtained a rutile TiO2 thin film with a refractive index of 2.72 at a wavelength of 1030nm, the highest refractive index ever reported.
•We prepared a titanium dioxide (TiO2) thin film to obtain a high refractive index.•We annealed a Ti thin film in air and optimized the annealing conditions.•The optimized TiO2 thin film has the highest refractive index ever reported.•An unusual method of preparing a thin film was developed in this study. |
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ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/j.tsf.2013.04.134 |