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Preparation of a dense TiO2 thin film by oxidizing metallic titanium

We prepared a dense rutile TiO2 thin film that has a refractive index as high as that of the bulk crystal by oxidizing metallic Ti thin film. The TiO2 thin film with a thickness of 260nm is optically transparent and has low coefficients of absorption and scattering. We annealed a Ti thin film at 100...

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Bibliographic Details
Published in:Thin solid films 2013-06, Vol.537, p.23-27
Main Authors: Yoshida, Fumiko, Tanaka, Momoko, Nagashima, Keisuke
Format: Article
Language:English
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Summary:We prepared a dense rutile TiO2 thin film that has a refractive index as high as that of the bulk crystal by oxidizing metallic Ti thin film. The TiO2 thin film with a thickness of 260nm is optically transparent and has low coefficients of absorption and scattering. We annealed a Ti thin film at 1000°C for oxidation and crystallization after deposition of metallic Ti by electron-beam evaporation. By optimizing the annealing conditions, we obtained a rutile TiO2 thin film with a refractive index of 2.72 at a wavelength of 1030nm, the highest refractive index ever reported. •We prepared a titanium dioxide (TiO2) thin film to obtain a high refractive index.•We annealed a Ti thin film in air and optimized the annealing conditions.•The optimized TiO2 thin film has the highest refractive index ever reported.•An unusual method of preparing a thin film was developed in this study.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2013.04.134