Self-organized periodic soft-hard nanolamellae in polycrystalline TiAlN thin films

We report on the spontaneous formation of periodically alternating cubic TiN and hexagonal AlN nanolamellae confined in grains of polycrystalline Ti0.05Al0.95N thin films produced by chemical vapour deposition. The characterization was performed using X-ray diffraction and transmission electron micr...

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Bibliographic Details
Published in:Thin solid films 2013-10, Vol.545, p.29-32
Main Authors: Keckes, J., Daniel, R., Mitterer, C., Matko, I., Sartory, B., Koepf, A., Weißenbacher, R., Pitonak, R.
Format: Article
Language:English
Subjects:
Chemical vapor deposition
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Diffraction
Exact sciences and technology
Formations
Hard materials
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Microstructure
Nanolamellae
Nanoscale materials and structures: fabrication and characterization
Nanostructure
Other semiconductors
Other topics in nanoscale materials and structures
Physics
Self-organization
Specific materials
Structure and morphology
thickness
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Thin films
TiAlN
X-rays
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Summary:We report on the spontaneous formation of periodically alternating cubic TiN and hexagonal AlN nanolamellae confined in grains of polycrystalline Ti0.05Al0.95N thin films produced by chemical vapour deposition. The characterization was performed using X-ray diffraction and transmission electron microscopy techniques. We discuss the lamellar microstructure with the periodicity of about 13nm and potential mechanisms responsible for the lamella formation. The finding opens the possibility to synthetize self-organized nanostructured thin films based on alternating soft and hard materials. •Production of TiAlN thin films with nanolamellae nanostructure•CVD deposition of self-organized cubic TiN/hexagonal AlN nanolamellae•Spontaneous growth of soft-hard nanocrystalline coatings
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2013.08.001