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Real-time curvature and optical spectroscopy monitoring of magnetron-sputtered WTi alloy thin films
WTi thin films are known as potential adhesion promoters and diffusion barriers. WTi thin films were deposited by magnetron sputtering from an alloyed target (W:Ti~70:30at.%). Real-time surface differential reflectance (SDR) spectroscopy and wafer-curvature measurements were performed during deposit...
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| Published in: | Surface & coatings technology 2013-12, Vol.237, p.112-117 |
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| creator | Le Priol, A. Simonot, L. Abadias, G. Guérin, P. Renault, P.-O. Le Bourhis, E. |
| description | WTi thin films are known as potential adhesion promoters and diffusion barriers. WTi thin films were deposited by magnetron sputtering from an alloyed target (W:Ti~70:30at.%). Real-time surface differential reflectance (SDR) spectroscopy and wafer-curvature measurements were performed during deposition to study the growth and the film continuity threshold. SDR measurements during WTi deposition allow the determination of the change in reflectivity of p-polarized light (at Si substrate Brewster's angle) between WTi film and Si substrate in order to monitor layer growth. The comparison between experimental and simulated WTi SDR signals assuming a homogeneous and continuous layer growth shows that film continuity is ensured beyond a thickness of 4.5±0.2nm. Real-time wafer-curvature measurements allow the determination of the intrinsic stress development in the film. Two regimes are noticed during the growth up to the development of a compressive steady state stress. The early stages of growth are rather complicated and divided into sub-regimes with similar boundaries revealed by both in situ techniques. Deposition of an interfacial continuous layer different from WTi bulk is suggested by both in situ techniques below a thickness of 4.5nm.
•We study in situ the growth stages of magnetron sputtered WTi films.•Two complementary optical and mechanical monitoring are performed.•The two techniques clearly show the continuity of WTi films at 4.5nm. |
| doi_str_mv | 10.1016/j.surfcoat.2013.08.065 |
| format | article |
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•We study in situ the growth stages of magnetron sputtered WTi films.•Two complementary optical and mechanical monitoring are performed.•The two techniques clearly show the continuity of WTi films at 4.5nm.</description><identifier>ISSN: 0257-8972</identifier><identifier>EISSN: 1879-3347</identifier><identifier>DOI: 10.1016/j.surfcoat.2013.08.065</identifier><identifier>CODEN: SCTEEJ</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Applied sciences ; Continuity ; Cross-disciplinary physics: materials science; rheology ; Deposition ; Exact sciences and technology ; In situ optical spectroscopy ; In situ wafer curvature ; Magnetron sputtering ; Materials science ; Metals. Metallurgy ; Methods of deposition of films and coatings; film growth and epitaxy ; Physics ; Production techniques ; Real time ; Reflectivity ; Silicon substrates ; Spectroscopy ; Stresses ; Surface treatment ; Surface treatments ; Thin film growth ; Thin films ; WTi alloy</subject><ispartof>Surface & coatings technology, 2013-12, Vol.237, p.112-117</ispartof><rights>2013 Elsevier B.V.</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c375t-60583586e700efcb269e37a77ca66a6deed3bd1b614b1756a2c099e1a6d3a0973</citedby><cites>FETCH-LOGICAL-c375t-60583586e700efcb269e37a77ca66a6deed3bd1b614b1756a2c099e1a6d3a0973</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>310,311,315,786,790,795,796,23958,23959,25170,27957,27958</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=28263225$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Le Priol, A.</creatorcontrib><creatorcontrib>Simonot, L.</creatorcontrib><creatorcontrib>Abadias, G.</creatorcontrib><creatorcontrib>Guérin, P.</creatorcontrib><creatorcontrib>Renault, P.-O.</creatorcontrib><creatorcontrib>Le Bourhis, E.</creatorcontrib><title>Real-time curvature and optical spectroscopy monitoring of magnetron-sputtered WTi alloy thin films</title><title>Surface & coatings technology</title><description>WTi thin films are known as potential adhesion promoters and diffusion barriers. WTi thin films were deposited by magnetron sputtering from an alloyed target (W:Ti~70:30at.%). Real-time surface differential reflectance (SDR) spectroscopy and wafer-curvature measurements were performed during deposition to study the growth and the film continuity threshold. SDR measurements during WTi deposition allow the determination of the change in reflectivity of p-polarized light (at Si substrate Brewster's angle) between WTi film and Si substrate in order to monitor layer growth. The comparison between experimental and simulated WTi SDR signals assuming a homogeneous and continuous layer growth shows that film continuity is ensured beyond a thickness of 4.5±0.2nm. Real-time wafer-curvature measurements allow the determination of the intrinsic stress development in the film. Two regimes are noticed during the growth up to the development of a compressive steady state stress. The early stages of growth are rather complicated and divided into sub-regimes with similar boundaries revealed by both in situ techniques. Deposition of an interfacial continuous layer different from WTi bulk is suggested by both in situ techniques below a thickness of 4.5nm.
•We study in situ the growth stages of magnetron sputtered WTi films.•Two complementary optical and mechanical monitoring are performed.•The two techniques clearly show the continuity of WTi films at 4.5nm.</description><subject>Applied sciences</subject><subject>Continuity</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Deposition</subject><subject>Exact sciences and technology</subject><subject>In situ optical spectroscopy</subject><subject>In situ wafer curvature</subject><subject>Magnetron sputtering</subject><subject>Materials science</subject><subject>Metals. Metallurgy</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Physics</subject><subject>Production techniques</subject><subject>Real time</subject><subject>Reflectivity</subject><subject>Silicon substrates</subject><subject>Spectroscopy</subject><subject>Stresses</subject><subject>Surface treatment</subject><subject>Surface treatments</subject><subject>Thin film growth</subject><subject>Thin films</subject><subject>WTi alloy</subject><issn>0257-8972</issn><issn>1879-3347</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNqFkE-LFDEQxYMoOK5-BclF8NK9lWQ66b4pi38WFgRZ8Rhq0tVrhu6kTdIL8-3NMKtXT3V479Xj_Rh7K6AVIPT1sc1bmlzE0koQqoW-Bd09YzvRm6FRam-esx3IzjT9YORL9irnIwAIM-x3zH0nnJviF-JuS49YtkQcw8jjWrzDmeeVXEkxu7ie-BKDLzH58MDjxBd8CFS10OR1K4USjfznvec4z_HEyy8f-OTnJb9mLyacM715ulfsx-dP9zdfm7tvX25vPt41TpmuNBq6XnW9JgNAkztIPZAyaIxDrVGPRKM6jOKgxf4gTKdROhgGElVSCINRV-z95e-a4u-NcrGLz47mGQPFLVuh91Ia3QuoVn2xujotJ5rsmvyC6WQF2DNVe7R_qdozVQu9rVRr8N1TB-aKZ0oYnM__0rKXWkl59n24-KgOfvSUbHaegqPRpwrUjtH_r-oPlpqTQQ</recordid><startdate>20131225</startdate><enddate>20131225</enddate><creator>Le Priol, A.</creator><creator>Simonot, L.</creator><creator>Abadias, G.</creator><creator>Guérin, P.</creator><creator>Renault, P.-O.</creator><creator>Le Bourhis, E.</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20131225</creationdate><title>Real-time curvature and optical spectroscopy monitoring of magnetron-sputtered WTi alloy thin films</title><author>Le Priol, A. ; Simonot, L. ; Abadias, G. ; Guérin, P. ; Renault, P.-O. ; Le Bourhis, E.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c375t-60583586e700efcb269e37a77ca66a6deed3bd1b614b1756a2c099e1a6d3a0973</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>Applied sciences</topic><topic>Continuity</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Deposition</topic><topic>Exact sciences and technology</topic><topic>In situ optical spectroscopy</topic><topic>In situ wafer curvature</topic><topic>Magnetron sputtering</topic><topic>Materials science</topic><topic>Metals. Metallurgy</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Physics</topic><topic>Production techniques</topic><topic>Real time</topic><topic>Reflectivity</topic><topic>Silicon substrates</topic><topic>Spectroscopy</topic><topic>Stresses</topic><topic>Surface treatment</topic><topic>Surface treatments</topic><topic>Thin film growth</topic><topic>Thin films</topic><topic>WTi alloy</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Le Priol, A.</creatorcontrib><creatorcontrib>Simonot, L.</creatorcontrib><creatorcontrib>Abadias, G.</creatorcontrib><creatorcontrib>Guérin, P.</creatorcontrib><creatorcontrib>Renault, P.-O.</creatorcontrib><creatorcontrib>Le Bourhis, E.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Surface & coatings technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Le Priol, A.</au><au>Simonot, L.</au><au>Abadias, G.</au><au>Guérin, P.</au><au>Renault, P.-O.</au><au>Le Bourhis, E.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Real-time curvature and optical spectroscopy monitoring of magnetron-sputtered WTi alloy thin films</atitle><jtitle>Surface & coatings technology</jtitle><date>2013-12-25</date><risdate>2013</risdate><volume>237</volume><spage>112</spage><epage>117</epage><pages>112-117</pages><issn>0257-8972</issn><eissn>1879-3347</eissn><coden>SCTEEJ</coden><notes>ObjectType-Article-1</notes><notes>SourceType-Scholarly Journals-1</notes><notes>ObjectType-Feature-2</notes><notes>content type line 23</notes><abstract>WTi thin films are known as potential adhesion promoters and diffusion barriers. WTi thin films were deposited by magnetron sputtering from an alloyed target (W:Ti~70:30at.%). Real-time surface differential reflectance (SDR) spectroscopy and wafer-curvature measurements were performed during deposition to study the growth and the film continuity threshold. SDR measurements during WTi deposition allow the determination of the change in reflectivity of p-polarized light (at Si substrate Brewster's angle) between WTi film and Si substrate in order to monitor layer growth. The comparison between experimental and simulated WTi SDR signals assuming a homogeneous and continuous layer growth shows that film continuity is ensured beyond a thickness of 4.5±0.2nm. Real-time wafer-curvature measurements allow the determination of the intrinsic stress development in the film. Two regimes are noticed during the growth up to the development of a compressive steady state stress. The early stages of growth are rather complicated and divided into sub-regimes with similar boundaries revealed by both in situ techniques. Deposition of an interfacial continuous layer different from WTi bulk is suggested by both in situ techniques below a thickness of 4.5nm.
•We study in situ the growth stages of magnetron sputtered WTi films.•Two complementary optical and mechanical monitoring are performed.•The two techniques clearly show the continuity of WTi films at 4.5nm.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.surfcoat.2013.08.065</doi><tpages>6</tpages></addata></record> |
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| ispartof | Surface & coatings technology, 2013-12, Vol.237, p.112-117 |
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| source | ScienceDirect Journals |
| subjects | Applied sciences Continuity Cross-disciplinary physics: materials science rheology Deposition Exact sciences and technology In situ optical spectroscopy In situ wafer curvature Magnetron sputtering Materials science Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Physics Production techniques Real time Reflectivity Silicon substrates Spectroscopy Stresses Surface treatment Surface treatments Thin film growth Thin films WTi alloy |
| title | Real-time curvature and optical spectroscopy monitoring of magnetron-sputtered WTi alloy thin films |
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