Laser-induced atomic adsorption: A mechanism for nanofilm formation

The authors have demonstrated and interpreted a technique of laser-induced formation of thin metallic films using alkali atoms on the window of a dense-vapour cell. The authors have show that, this intriguing photo-stimulated process originates from the adsorption of Cs atoms via the neutralization...

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Bibliographic Details
Published in:Europhysics letters 2013-11, Vol.104 (3), p.1-1
Main Authors: Martins, Weliton S, de Silans, Thierry Passerat, Oriá, Marcos, Chevrollier, Martine
Format: Article
Language:English
Subjects:
Adsorption
Film growth
Film thickness
Lasers
Lithography
Surface chemistry
Thin films
Vapour
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Summary:The authors have demonstrated and interpreted a technique of laser-induced formation of thin metallic films using alkali atoms on the window of a dense-vapour cell. The authors have show that, this intriguing photo-stimulated process originates from the adsorption of Cs atoms via the neutralization of Cs^sup +^ ions by substrate electrons. The Cs^sup +^ ions are produced via two-photon absorption by excited Cs atoms very close to the surface, which enables the transfer of the laser spatial intensity profile to the film thickness. An initial decrease of the surface work function is required to guarantee Cs^sup +^ neutralization and results in a threshold in the vapour density. This understanding of the film growth mechanism may facilitate the development of new techniques of laser-controlled lithography, starting from thermal vapours.
ISSN:0295-5075
1286-4854