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Effect of stacking type in precursors on composition, morphology and electrical properties of the CIGS films
The copper-indium-gallium (CIG) metallic precursors with different stacking type (A: CuGa/CuIn/CuGa/glass and B: CuInGa/CuIn/CuInGa/glass) were prepared onto glass substrates by magnetron sputtering method. In order to prepare Cu(In 1−x Ga x )Se 2 (CIGS) thin films, the CIG precursors were then sele...
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Published in: | Journal of materials science. Materials in electronics 2013-07, Vol.24 (7), p.2553-2557 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The copper-indium-gallium (CIG) metallic precursors with different stacking type (A: CuGa/CuIn/CuGa/glass and B: CuInGa/CuIn/CuInGa/glass) were prepared onto glass substrates by magnetron sputtering method. In order to prepare Cu(In
1−x
Ga
x
)Se
2
(CIGS) thin films, the CIG precursors were then selenized with solid Se powder using a three-step reaction temperature profile. The influence of stacking type in precursors on structure, composition, morphology and electrical properties of the CIGS films is investigated by X-ray diffraction, energy dispersive spectrometer, scanning electron microscope and Hall effect measurement. The results reveal that the stacking type of the precursor has a strong influence on composition, morphology and properties of the CIGS thin films. The atomic ratios of Cu/(In+Ga)/Se of the CIGS films A and B are 1.61:1:2.11 and 1.39:1:2.04, respectively. The better quality CIGS thin films can be obtained through selenization of metallic precursor of CuInGa/CuIn/CuInGa/glass. The CIGS films are p-type semiconductor material. The hole concentration, resistivity and hole mobility of the CIGS thin films is 2.51 × 10
17
cm
−3
, 3.11 × 10
4
Ω cm and 19.8 cm
2
V
−1
s
−1
, respectively. |
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ISSN: | 0957-4522 1573-482X |
DOI: | 10.1007/s10854-013-1132-3 |