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Effect of stacking type in precursors on composition, morphology and electrical properties of the CIGS films

The copper-indium-gallium (CIG) metallic precursors with different stacking type (A: CuGa/CuIn/CuGa/glass and B: CuInGa/CuIn/CuInGa/glass) were prepared onto glass substrates by magnetron sputtering method. In order to prepare Cu(In 1−x Ga x )Se 2 (CIGS) thin films, the CIG precursors were then sele...

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Bibliographic Details
Published in:Journal of materials science. Materials in electronics 2013-07, Vol.24 (7), p.2553-2557
Main Authors: Liu, Jun, Wei, Ai Xiang, Zhao, Yu, Yan, Zhi Qiang
Format: Article
Language:English
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Summary:The copper-indium-gallium (CIG) metallic precursors with different stacking type (A: CuGa/CuIn/CuGa/glass and B: CuInGa/CuIn/CuInGa/glass) were prepared onto glass substrates by magnetron sputtering method. In order to prepare Cu(In 1−x Ga x )Se 2 (CIGS) thin films, the CIG precursors were then selenized with solid Se powder using a three-step reaction temperature profile. The influence of stacking type in precursors on structure, composition, morphology and electrical properties of the CIGS films is investigated by X-ray diffraction, energy dispersive spectrometer, scanning electron microscope and Hall effect measurement. The results reveal that the stacking type of the precursor has a strong influence on composition, morphology and properties of the CIGS thin films. The atomic ratios of Cu/(In+Ga)/Se of the CIGS films A and B are 1.61:1:2.11 and 1.39:1:2.04, respectively. The better quality CIGS thin films can be obtained through selenization of metallic precursor of CuInGa/CuIn/CuInGa/glass. The CIGS films are p-type semiconductor material. The hole concentration, resistivity and hole mobility of the CIGS thin films is 2.51 × 10 17  cm −3 , 3.11 × 10 4  Ω cm and 19.8 cm 2  V −1  s −1 , respectively.
ISSN:0957-4522
1573-482X
DOI:10.1007/s10854-013-1132-3