Sputtering of dielectric single layers by metallic mode reactive sputtering and conventional reactive sputtering from cylindrical cathodes in a sputter-up configuration

In today's sputtering solutions in the field of precision optics, usually planar targets are used which suffer from inhomogeneous surface erosion. This leads to a drift in uniformity over time, higher material costs and in the case of reactive sputtering an increased tendency to form arcs which...

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Bibliographic Details
Published in:Thin solid films 2013-04, Vol.532, p.98-105
Main Authors: Rademacher, Daniel, Zickenrott, Tobias, Vergöhl, Michael
Format: Article
Language:English
Subjects:
Coatings
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Cylindrical
Deposition by sputtering
Dielectric thin films
Dielectrics, piezoelectrics, and ferroelectrics and their properties
Drift
Erosion
Exact sciences and technology
Magnetron
Magnetrons
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Optical
Particle
Physics
Precision
Sputter
Sputtering
Structure and morphology
thickness
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Tantalum oxides
Target
Thin film structure and morphology
Thin films
Turntables
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Summary:In today's sputtering solutions in the field of precision optics, usually planar targets are used which suffer from inhomogeneous surface erosion. This leads to a drift in uniformity over time, higher material costs and in the case of reactive sputtering an increased tendency to form arcs which cause particle generation. In this paper an approach is presented that overcomes the disadvantages planar magnetrons present to sputtering. A rotating turntable coater was equipped with two dual cylindrical magnetrons in a sputter-up configuration. Thin films prepared by metallic mode reactive sputtering as well as reactive mid-frequency sputtering were investigated. Properties of Ta2O5 and SiO2 such as film stress, optical density and surface roughness are discussed. It is sown that the coatings are suitable for applications in precision optics. ► Cylindrical magnetrons can be well used in a sputter up configuration. ► Cylindrical magnetrons were used to create transparent oxide layers. ► Metallic mode reactive sputtering yields bulk-like refractive indexes. ► Ta2O5 and SiO2 growth is driven by different parameters.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2012.11.101