An X-ray photoelectron spectroscopy study of strontium-titanate-based high-k film stacks

Stoichiometric and Sr-rich strontium-titanate (STO) nanofilms grown on thin TiN layers over SiO2/Si were studied by X-ray photoelectron spectroscopy (XPS) at two analyzer exit angles, both as-deposited and after rapid thermal annealing (RTA) at 650°C in N2. Individual layer thickness and composition...

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Bibliographic Details
Published in:Microelectronic engineering 2012-02, Vol.90 (Feb), p.138-140
Main Authors: Sygellou, L., Tielens, H., Adelmann, C., Ladas, S.
Format: Article
Language:English
Subjects:
Annealing
Compacting
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Nanoscale materials and structures: fabrication and characterization
Nanostructure
Other topics in nanoscale materials and structures
Photoelectron spectroscopy
Physics
Strontium
Strontium titanates
Thin films
Titanium
X-ray photoelectron spectroscopy
X-rays
XPS
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Summary:Stoichiometric and Sr-rich strontium-titanate (STO) nanofilms grown on thin TiN layers over SiO2/Si were studied by X-ray photoelectron spectroscopy (XPS) at two analyzer exit angles, both as-deposited and after rapid thermal annealing (RTA) at 650°C in N2. Individual layer thickness and composition, mutually dependent via the electron transport properties of the film matrix, were iteratively obtained using a set of empirical relative sensitivity factors (RSF), as well as inelastic mean free paths with their elastic corrections, as per ISO18118:2004(E). Successive layer thicknesses and average Sr/Ti atomic ratios were consistent with the nominal description of the samples, provided a superficial SrCO3 phase inadvertently formed over STO during growth is taken into account. This phase was strongly reduced upon RTA, with considerable compacting of the STO layers.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2011.03.003