Investigations on Compositional, Structural and Optical Properties of Thermally Oxidized HfO2 Films

Thermal oxidation at various temperatures on magnetron sputtered hafnium films shown significant effect on stoichiometry, crystallographic structure and electrical and optical properties. X-ray photoelectron spectroscopy confirms the stoichiometry of HfO 2 films by showing the relevant shift in the...

Full description

Saved in:
Bibliographic Details
Published in:Arabian journal for science and engineering (2011) 2022, Vol.47 (6), p.7541-7549
Main Authors: Venkataiah, S., Chandra, S. V. Jagadeesh, Babu, M. Vasu, Uthanna, S.
Format: Article
Language:English
Subjects:
Crystal structure
Crystallography
Engineering
Hafnium oxide
Humanities and Social Sciences
multidisciplinary
Optical properties
Oxidation
Photoelectrons
Refractivity
Research Article-Physics
Science
Stoichiometry
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Thermal oxidation at various temperatures on magnetron sputtered hafnium films shown significant effect on stoichiometry, crystallographic structure and electrical and optical properties. X-ray photoelectron spectroscopy confirms the stoichiometry of HfO 2 films by showing the relevant shift in the core level binding energies of hafnium and oxygen after increasing the oxidation temperature to 600 °C. The EDAX analysis also confirmed the required composition of HfO 2 films. The presence of monoclinic HfO 2 structure was identified by XRD for the films oxidized at 600 °C. The interface quality at HfO 2 /Si stacks was improved as a function of oxidation temperature. The optical band gap and the refractive index of the HfO 2 films increased with increase of oxidation temperature.
ISSN:2193-567X
1319-8025
2191-4281
DOI:10.1007/s13369-021-06218-x