Creation of Thin Films of NbN at Room Temperature of the Substrate

Magnetron sputtering is used for preparing thin NbN films. The films are deposited on sapphire substrates at temperatures from 20 to 300°C. The superconducting transition temperature for various samples is in the range of 8–14 K depending on the substrate temperature during deposition. The critical...

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Bibliographic Details
Published in:Physics of the solid state 2021-09, Vol.63 (9), p.1366-1368
Main Authors: Gurovich, B. A., Goncharov, B. V., Prikhod’ko, K. E., Kutuzov, L. V., Stolyarov, L. V., Malieva, E. M.
Format: Article
Language:English
Subjects:
Critical current density
Deposition
Dielectric films
Magnetron sputtering
Multilayers
Niobium nitride
Physics
Physics and Astronomy
Room temperature
Sapphire
Solid State Physics
Substrates
Superconductors
Temperature
Thin films
Transition temperature
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Summary:Magnetron sputtering is used for preparing thin NbN films. The films are deposited on sapphire substrates at temperatures from 20 to 300°C. The superconducting transition temperature for various samples is in the range of 8–14 K depending on the substrate temperature during deposition. The critical current density j c is in the range of 0.8–8 MA/cm 2 , which makes it possible to use these films to create multilayer structures due to the absence of anneals, which each underlying layer of structures is subjected to during the deposition of each subsequent layer.
ISSN:1063-7834
1090-6460
DOI:10.1134/S1063783421090092