Loading…

Stripping of carbon coatings in radio-frequency inductively coupled plasma of H2/Ar

This article describes the stripping of amorphous carbon (a-C) coatings in an H2/Ar atmosphere using a radio-frequency inductively coupled plasma (RF-ICP) source. The power of the RF-ICP source, atmosphere composition (H2/Ar) and bias potential strongly affect the stripping rate (0.7–9.3 μm/h), whil...

Full description

Saved in:
Bibliographic Details
Published in:Surface & coatings technology 2021-12, Vol.427, p.127837, Article 127837
Main Authors: Sidelev, Dmitrii V., Ruchkin, Sergey E., Yurjev, Yuriy N., Lomygin, Anton, Syrtanov, Maxim S., Stolbovskaya, Galina N., Ukhanov, Sergey
Format: Article
Language:English
Subjects:
Citations: Items that this one cites
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:This article describes the stripping of amorphous carbon (a-C) coatings in an H2/Ar atmosphere using a radio-frequency inductively coupled plasma (RF-ICP) source. The power of the RF-ICP source, atmosphere composition (H2/Ar) and bias potential strongly affect the stripping rate (0.7–9.3 μm/h), while the operating pressure has less influence (2.7–3.2 μm/h). The selectivity of stripping of a-C and titanium coatings can be varied from 1 up to ~90 by changing the atmosphere composition. Chemical sputtering plays a key role in the productivity and selectivity of carbon stripping, it should have a higher rate compared to physical sputtering to enable high selectivity of coating stripping. Raman spectroscopy reveals the increase in graphitization degree and decreasing less ordered carbon of a-C coatings under stripping in H2/Ar plasma. Phase transformations of sublayer or substrate materials could occur under coating stripping in a reactive atmosphere in the example of hydride formation (TiH2-x) in a Ti sublayer. •Stripping of carbon coatings in RF-ICP plasma of H2/Ar.•Stripping selectivity of carbon coatings is regulated by H2/Ar flow rates.•Graphitization of a-C coatings under stripping in H2/Ar plasma.
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2021.127837