Loading…
Stripping of carbon coatings in radio-frequency inductively coupled plasma of H2/Ar
This article describes the stripping of amorphous carbon (a-C) coatings in an H2/Ar atmosphere using a radio-frequency inductively coupled plasma (RF-ICP) source. The power of the RF-ICP source, atmosphere composition (H2/Ar) and bias potential strongly affect the stripping rate (0.7–9.3 μm/h), whil...
Saved in:
Published in: | Surface & coatings technology 2021-12, Vol.427, p.127837, Article 127837 |
---|---|
Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Summary: | This article describes the stripping of amorphous carbon (a-C) coatings in an H2/Ar atmosphere using a radio-frequency inductively coupled plasma (RF-ICP) source. The power of the RF-ICP source, atmosphere composition (H2/Ar) and bias potential strongly affect the stripping rate (0.7–9.3 μm/h), while the operating pressure has less influence (2.7–3.2 μm/h). The selectivity of stripping of a-C and titanium coatings can be varied from 1 up to ~90 by changing the atmosphere composition. Chemical sputtering plays a key role in the productivity and selectivity of carbon stripping, it should have a higher rate compared to physical sputtering to enable high selectivity of coating stripping. Raman spectroscopy reveals the increase in graphitization degree and decreasing less ordered carbon of a-C coatings under stripping in H2/Ar plasma. Phase transformations of sublayer or substrate materials could occur under coating stripping in a reactive atmosphere in the example of hydride formation (TiH2-x) in a Ti sublayer.
•Stripping of carbon coatings in RF-ICP plasma of H2/Ar.•Stripping selectivity of carbon coatings is regulated by H2/Ar flow rates.•Graphitization of a-C coatings under stripping in H2/Ar plasma. |
---|---|
ISSN: | 0257-8972 1879-3347 |
DOI: | 10.1016/j.surfcoat.2021.127837 |