Investigation of transport processes in a commercial hot wall CVD reactor with multi-substrates for high-quality pyrocarbon deposition

A 3D CFD model is developed to illustrate the complex reacting flow in the commercial hot-wall CVD reactor using detailed gas and surface chemistry. This helps to understand multi-species transport and their interplay with the gas and surface reactions for pyrocarbon (PyC) deposition. The detailed t...

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Bibliographic Details
Published in:Surface & coatings technology 2021-11, Vol.425, p.127685, Article 127685
Main Authors: Shinde, Vijay M., Deivendran, Balamurugan, Kumar, Harish, Eswara Prasad, N.
Format: Article
Language:English
Subjects:
3D modeling
Chemical kinetics
Chemical vapor deposition
Hot-wall CVD reactor
Model accuracy
Physical properties
Process optimization
Pyrocarbon
Reacting flow
Response surface methodology
Sensitivity analysis
Substrates
Surface reactions
Temperature dependence
Three dimensional models
Transport phenomena
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Summary:A 3D CFD model is developed to illustrate the complex reacting flow in the commercial hot-wall CVD reactor using detailed gas and surface chemistry. This helps to understand multi-species transport and their interplay with the gas and surface reactions for pyrocarbon (PyC) deposition. The detailed transport phenomena models with temperature-dependent physical properties are incorporated into the model to improve accuracy. Valuable information such as microscopic local variations in gas velocity, temperature, and species distributions is obtained, which otherwise difficult to acquire experimentally. A sensitivity analysis is also performed to realize how the operating conditions affect the distributions of intermediate species and, ultimately, the growth rate of PyC. The understanding gained in this study is further used to optimize the CVD reactor to obtain high-quality PyC. The response surface methodology is employed to examine the interactions among various operating parameters that influence film performance. •A 3D model is developed for the commercial hot-wall CVD reactor.•Use of detailed gas and surface chemistry into the model to improve accuracy.•Study the interactions of various process parameters that affect the film quality.•Process optimization to obtain high-quality PyC deposition.
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2021.127685