Cleaning of the dielectric surfaces using a controlled gas-discharge source of fast neutral particles

In the present work is proposed the design of a controlled gas-discharge source of fast neutral particles, allowing to clean surfaces of dielectric and semiconductor materials. Also are shown the results of the research of the source main working characteristics.

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Bibliographic Details
Published in:Journal of physics. Conference series 2017-07, Vol.872 (1), p.12021
Main Authors: Fadeev, A S, Talanov, A S, Kostrin, D K, Trifonov, S A, Lisenkov, A A, Goncharov, V D
Format: Article
Language:English
Subjects:
Cleaning
Discharge
Neutral particles
Physics
Semiconductor materials
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Description
Summary:In the present work is proposed the design of a controlled gas-discharge source of fast neutral particles, allowing to clean surfaces of dielectric and semiconductor materials. Also are shown the results of the research of the source main working characteristics.
ISSN:1742-6588
1742-6596
1742-6596
DOI:10.1088/1742-6596/872/1/012021