Plasma-Chemical Synthesis of Lead Sulphide Thin Films for Near-IR Photodetectors

Lead sulfide (PbS) thin films of different morphology were synthesized via direct interaction of lead and sulfur vapors. Low temperature nonequilibrium RF (40.68 MHz) plasma discharge at low pressure ((3–5) × 10 –3  Torr) was used for the initiation of chemical interaction between precursors in the...

Full description

Saved in:
Bibliographic Details
Published in:Plasma chemistry and plasma processing 2021, Vol.41 (1), p.493-506
Main Authors: Mochalov, Leonid, Logunov, Alexander, Prokhorov, Igor, Sazanova, Tatyana, Kudrin, Aleksey, Yunin, Pavel, Zelentsov, Sergey, Letnianchik, Aleksey, Starostin, Nikolay, Boreman, Glenn, Vorotyntsev, Vladimir
Format: Article
Language:English
Subjects:
Characterization and Evaluation of Materials
Chemical composition
Chemical reactions
Chemical synthesis
Chemistry
Chemistry and Materials Science
Classical Mechanics
Inorganic Chemistry
Lead sulfides
Low pressure
Low temperature
Mechanical Engineering
Morphology
Optical emission spectroscopy
Optical properties
Original Paper
Plasma
Plasma jets
Precursors
Process parameters
Solid phases
Stoichiometry
Substrates
Thin films
Vapor phases
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Lead sulfide (PbS) thin films of different morphology were synthesized via direct interaction of lead and sulfur vapors. Low temperature nonequilibrium RF (40.68 MHz) plasma discharge at low pressure ((3–5) × 10 –3  Torr) was used for the initiation of chemical interaction between precursors in the gas phase. The in-situ Optical Emission Spectroscopy (OES) was utilized to determine the exited reactive species existing in plasma discharge and possible mechanism of plasma-chemical reactions resulting in the formation of the solid phase. The chemical composition, structure and morphology of the surface of the as-deposited materials in dependence of parameters of the plasma process such as stoichiometry of the precursors in the gas phase, power of the plasma discharge and substrate temperature were characterized by SEM, XRD and AFM analytical techniques. The optical properties and electrophysical parameters of the samples were studied as well.
ISSN:0272-4324
1572-8986
DOI:10.1007/s11090-020-10123-w